ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...
ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...
Intel announced that it had installed ASML's Twinscan EXE:5200B, the industry's first High-NA lithography tool with 0.55 numerical aperture projection optics made for commercial chip production. The ...
The semiconductor industry is moving full speed ahead to develop high-NA EUV, but bringing up this next generation lithography system and the associated infrastructure remains a monumental and ...
After nearly three decades of development, a new generation of ASML's integrated circuit fabrication tools is now available to semiconductor chip manufacturers. The new production line employs a state ...
Highly anticipated: ASML specializes in manufacturing photolithography machines used to etch computer chips out of silicon wafers. The Dutch corporation is, indeed, the most highly valued European ...
After a period of delays, EUV pellicles are emerging and becoming a requirement in high-volume production of critical chips. At the same time, the pellicle landscape for extreme ultraviolet (EUV) ...
Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...
The semiconductor equipment giant ASML and electronics research center imec have opened a joint laboratory dedicated to high-numerical aperture (high-NA) extreme ultraviolet (EUV) lithography, seen by ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback